| 摘要 |
An anti-corrosive photoresist-removing agent composition, which contains a polar organic solvent (A), an organic amine compound (B) and an anti-corrosive agent (C) which is composed of a combination of an aromatic polyhydroxy compound and a saccharide. The anti-corrosive photoresist-removing agent composition exhibits an excellent anti-corrosive effect on both copper and aluminum over a wide temperature range in the presence or absence of water. |
