发明名称 |
LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD. |
摘要 |
<p>A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device to move through a projection area of each of the optical columns to measure a beam of each of the optical columns.</p> |
申请公布号 |
NL2006261(A) |
申请公布日期 |
2011.08.29 |
申请号 |
NL20112006261 |
申请日期 |
2011.02.18 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
ONVLEE, JOHANNES;JAGER, PIETER;ZWET, ERWIN |
分类号 |
G03F7/20 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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