发明名称 DISPERSION CONTAINING HOLLOW SIO2, COATING COMPOSITION, AND SUBSTRATE WITH ANTIREFLECTION COATING FILM
摘要 To provide a dispersion of hollow SiO 2 , capable of obtaining, when formed into a coating composition, an antireflection film having high antireflection properties and low chroma saturation by forming a low refractive index coating film having a refractive index gradient. A dispersion of fine silica particles, having agglomerated particles which are agglomerates of primary fine particles of hollow SiO 2 dispersed in a dispersion medium, wherein the average particle size of the agglomerated particles is within a range of from 60 to 400 nm, and the average particle size is at least 1.5 times the average primary particle size of the silica. When a coating composition containing the dispersion is to be obtained, the matrix component is preferably a precursor of a metal oxide or an organic resin. By applying the coating composition to a substrate, a substrate with an antireflection coating film is obtained.
申请公布号 HK1118304(A1) 申请公布日期 2011.08.26
申请号 HK20080109359 申请日期 2008.08.21
申请人 ASAHI GLASS COMPANY LIMITED 发明人 KAWAI, YOHEI;YONEDA, TAKASHIGE
分类号 B05D;B32B;C01B;C09D;G02B 主分类号 B05D
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