发明名称 METHOD FOR PRODUCING SEMICONDUCTOR GAS
摘要 <p>Disclosed is a method for producing monofluoro methane, which involves at least a pyrolysis step in which a 1-methoxy-1,1,2,2-tetrafluoro ethane is pyrolyzed by bringing same into contact with a catalyst, and a step for collecting monofluoro methane from the pyrolysis product. As a consequence, it is possible to efficiently and practically produce monofluoro methane that essentially does not contain halogens except fluorine.</p>
申请公布号 WO2011102268(A1) 申请公布日期 2011.08.25
申请号 WO2011JP52702 申请日期 2011.02.09
申请人 CENTRAL GLASS COMPANY, LIMITED;TAKADA, NAOTO;IMURA, HIDEAKI;OKAMOTO, MASAMUNE 发明人 TAKADA, NAOTO;IMURA, HIDEAKI;OKAMOTO, MASAMUNE
分类号 C07C17/361;C07B61/00;C07C19/08;C07C51/58;C07C53/48;C09K13/08;C11D7/30;H01L21/3065 主分类号 C07C17/361
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