发明名称 |
METHOD FOR PRODUCING SEMICONDUCTOR GAS |
摘要 |
<p>Disclosed is a method for producing monofluoro methane, which involves at least a pyrolysis step in which a 1-methoxy-1,1,2,2-tetrafluoro ethane is pyrolyzed by bringing same into contact with a catalyst, and a step for collecting monofluoro methane from the pyrolysis product. As a consequence, it is possible to efficiently and practically produce monofluoro methane that essentially does not contain halogens except fluorine.</p> |
申请公布号 |
WO2011102268(A1) |
申请公布日期 |
2011.08.25 |
申请号 |
WO2011JP52702 |
申请日期 |
2011.02.09 |
申请人 |
CENTRAL GLASS COMPANY, LIMITED;TAKADA, NAOTO;IMURA, HIDEAKI;OKAMOTO, MASAMUNE |
发明人 |
TAKADA, NAOTO;IMURA, HIDEAKI;OKAMOTO, MASAMUNE |
分类号 |
C07C17/361;C07B61/00;C07C19/08;C07C51/58;C07C53/48;C09K13/08;C11D7/30;H01L21/3065 |
主分类号 |
C07C17/361 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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