| 摘要 |
<P>PROBLEM TO BE SOLVED: To disclose an apparatus and method for maintaining an immersion fluid 212 in a gap neighboring to a projection lens 16 during exchange of a workpiece 208 of a lithography machine. <P>SOLUTION: The apparatus and method include: an optical assembly 16 constructed so as to project an image onto a work piece 208; and a stage assembly 202 including a work piece table 204 that supports the work piece 208 adjacent to the optical assembly 16. An environmental system 26 is provided to supply and remove the immersion fluid 212 to and from the gap between the optical assembly 16 and the work piece 208 on the stage assembly 202. After exposure of the work piece 208 is completed, an exchange system 216 removes the work piece 208 and replaces it with a second work piece. An immersion fluid containment system 214 maintains the immersion fluid 212 in the gap during removal of the first work piece 208 and replacement with the second work piece. <P>COPYRIGHT: (C)2011,JPO&INPIT |
