CHAMBER APPARATUS, AND EXTREME ULTRAVIOLET LIGHT GENERATING DEVICE

摘要

Disclosed is a chamber apparatus used with a laser system, which may be provided with: a chamber which has at least one inlet for allowing the laser light emitted from the aforementioned laser system to enter; a target supply unit which is disposed on the chamber and which supplies a target substance to a predetermined region in the chamber; a magnetic field generating unit which generates a magnetic field in the aforementioned predetermined region; and a charged particle collecting unit which collects the charged particles that are arranged in the direction of the magnetic line of the magnetic force, are generated by irradiating the aforementioned target substance with the aforementioned laser light in the chamber, and move along the aforementioned magnetic line.