CONSTANT VOLUME CLOSURE VALVE FOR VAPOR PHASE DEPOSITION SOURCE

摘要

The patent describes a vapor-phase deposition source comprising a vessel equipped with two zones. The first zone is for the production of vapor. It is equipped with a receptacle for the material and means for heating the material placed in the receptacle. The second is a diffusion zone comprising a vessel communicating with the production zone and equipped with at least one opening so that the vapor-phase material is transmitted towards the exterior of the vessel through the opening. The source is characterized in that it comprises means for closing the orifice and means for moving the means for closing between an active closed position and an orifice open position without changing the volume of the diffusion zone.