发明名称 METHOD OF MANUFACTURING PHOTOELECTRIC CONVERSION ELEMENT
摘要 <p><P>PROBLEM TO BE SOLVED: To improve conversion efficiency of a photoelectric conversion element without using KCN for surface processing on a photoelectric conversion semiconductor layer. <P>SOLUTION: A method of manufacturing the photoelectric conversion element 1 has a lower electrode 20, the photoelectric conversion semiconductor layer 30, a buffer layer 40, and a translucent conductive layer 60 laminated in order on a substrate 10. In the method of manufacturing the photoelectric conversion element 1, the buffer layer 40 is formed on the photoelectric conversion semiconductor layer 30 having been subjected to the surface processing after a surface of the photoelectric conversion semiconductor layer 30 is processed with a surface processing liquid containing a compound having an amino group, and hydrogen peroxide. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011165900(A) 申请公布日期 2011.08.25
申请号 JP20100027089 申请日期 2010.02.10
申请人 FUJIFILM CORP 发明人 KOIKE MICHIJI
分类号 H01L31/04 主分类号 H01L31/04
代理机构 代理人
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