| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a liquid crystal device, a method of manufacturing the same, and an electronic device capable of flattening the upper layer side of a depression without performing long time deposition and polishing. <P>SOLUTION: In an element substrate 10 of the liquid crystal device 100, a recess 5a formed at the lower layer side of an insulating film 160 is flattened by being filled with an insulating film 160 formed of a silicon oxide film. First, in a deposition process, the insulating film 160 is deposited until a void 160v formed in a region overlapping the depression 5a in the process of depositing the insulating film 160 by chemical vapor deposition is closed by the insulating film 160. Subsequently, in a polishing process, the surface of the insulating film 160 is polished to such an extent that the void 160v is not exposed to the surface of the insulating film 160. <P>COPYRIGHT: (C)2011,JPO&INPIT |
