| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a fine etching mask which can equalize and thin the residue thickness of a pattern transfer layer after transformation in a transfer layer, and having an equalized thickness after an etching process, in a method of manufacturing a fine etching mask by pattern transfer to a processed material, and to provide an exposure processing apparatus. SOLUTION: A method of manufacturing a fine etching mask includes: an applying process of applying a light curing resin to a processed material layer film; a molding hardening process of transferring a resin pattern layer to a resin mold 20 on an outer peripheral surface of a back roll 31 having an elastic layer; a peeling process of peeling the processed material film after the molding hardening process from the resin mold 20; and an etching process of removing a residue of the transferred pattern. In the molding hardening process, the transferred pattern is molded on a condition that the Young's modulus of the elastic layer of the back roll 31 satisfies a predetermined value. COPYRIGHT: (C)2011,JPO&INPIT
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