SULFONAMIDE-CONTAINING PHOTORESIST COMPOSITIONS AND METHODS OF USE

摘要

Provided are sulfonamide-containing photoresist compositions for use in lithographic processes that have improved properties for high resolution, low blur imaging. Also provided are alcohol- soluble photoresists for resist-on-resist applications. The sulfonamide- containing photoresist compositions of the present invention include positive-tone photoresist compositions that have sulfonamide-substituted repeat units with branched linking group as shown in Formula (I).