发明名称 |
COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM CONTAINING SILICON HAVING NITROGEN-CONTAINING RING |
摘要 |
Disclosed is a composition for forming a resist underlayer film for lithography purposes, which is used for the formation of a resist underlayer film that can be used as a hard mask. Specifically disclosed is a composition for forming a resist underlayer film for lithography purposes, which contains a hydrolysable organosilane or a hydrylysate or hydrolyzed and condensed product thereof as a silane compound, wherein a hydrolysable organosilane represented by formula (1) [wherein R1 represents a group represented by formula (2) (wherein R4 represents an organic group; R5 represents an alkylene group having 1 to 10 carbon atoms, a hydroxyalkylene group, a sulfide bond, an ether bond, an ester bond, or a combination of any two or more of them; and X1 represents a group represented by formula (3), (4) or (5)); R2 represents an organic group; and R3 represents a hydrolysable group] is contained as the hydrolysable organosilane. |
申请公布号 |
WO2011102470(A1) |
申请公布日期 |
2011.08.25 |
申请号 |
WO2011JP53525 |
申请日期 |
2011.02.18 |
申请人 |
NISSAN CHEMICAL INDUSTRIES, LTD.;NAKAJIMA, MAKOTO;KANNO, YUTA;SHIBAYAMA, WATARU |
发明人 |
NAKAJIMA, MAKOTO;KANNO, YUTA;SHIBAYAMA, WATARU |
分类号 |
G03F7/11;C07F7/18;C08G77/26;G03F7/40;H01L21/027 |
主分类号 |
G03F7/11 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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