DEVELOPING APPARATUS, DEVELOPING METHOD, AND STORAGE MEDIUM

摘要

PROBLEM TO BE SOLVED: To provide a developing apparatus which obtains a high throughput. SOLUTION: The developing apparatus includes: an airtight processing vessel having a processing atmosphere formed therein; an atmosphere gas supplying unit for supplying mist of a developing liquid into the processing vessel to condense the developing liquid on the surfaces of a substrate transported into the processing vessel and thereby to form a liquid film thereon; and a drying unit for drying the substrate to stop the developing action of the liquid film. Since the reaction between the developing liquid and a resist can be stopped, the developing operation can be carried out concurrently with the cleaning operation of a cleaning module, thus a high throughput is attained. COPYRIGHT: (C)2011,JPO&INPIT