| 摘要 |
PROBLEM TO BE SOLVED: To provide a positioning device for a workpiece, which enables a vapor-deposition film with uniform film quality on a region to be film-formed thereon of a three-dimensional curved surface shape, while avoiding the upsizing and complication of the device structure. SOLUTION: A positioning device 13 according to one embodiment is used for forming a film on the workpiece having the region to be film-formed thereon which is rotationally symmetric and has the three-dimensional curved surface shape, and includes: a support body 30 for supporting the workpiece W; a rotating mechanism and a tilting mechanism for rotating and tilting the support body 30; and a control unit 16 for controlling the rotating mechanism and the tilting mechanism. The rotating mechanism rotates the support body 30 around a rotational symmetric axis ax1 (θdirection) of the workpiece W, and the tilting mechanism tilts the support body 30 around an axis ax2 (ψdirection) perpendicular to an incident direction (Z-axis direction) of a vapor deposition particle p1. The control unit 16 controls the rotating mechanism and the tilting mechanism in order to adjust the incident position of the vapor deposition particle p1 with respect to the workpiece W. COPYRIGHT: (C)2011,JPO&INPIT
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