| 摘要 |
A wet scrubber (1) and a method of using the wet scrubber to clean a process gas containing sulphur dioxide comprising at least one spray level system (20) with atomizing nozzles (38) to which an absorption liquid is supplied for atomization by the nozzles (38). The method comprises operating the spray level system (20) in at least a first operating mode with an active nozzle density of at least 0.7 nozzles/m2, an absorption liquid flow of at least 10 m3/hour per nozzle and a Total Flow of at least 30 m3/hour/m2.
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