CLEANING EQUIPMENT FOR 4 INCH GAAS WAFER

摘要

PURPOSE: A cleaning device for a 4 inch GaAs wafer is provided to reduce process time by minimizing the transfer time of a tray using a one-way shuttle. CONSTITUTION: An ultra-pure water spraying unit removes foreign materials on a wafer. A loading unit loads the wafer. A support is fixed to the lower side of the loading unit. A moving unit is composed of a shuttle(4) which moves a tray(6) of the loading unit. A cleaning unit includes a plurality of spray nozzles for spraying ultra-pure water.