| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure device, restraining thermal deformation of a frame of a mask holding part to improve exposure accuracy. <P>SOLUTION: A mask stage base 11 includes a plurality of hollow frames 91-94, and the air, the temperature of which is controlled together with the air supplied into a thermal chamber 80, is supplied into the interiors of the hollow frames 91-94. <P>COPYRIGHT: (C)2011,JPO&INPIT |
