发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To solve the problem with a semiconductor device which use properties of a semiconductor of nano-materials, wherein the semiconductor characteristics are degraded due to a metallic nano-material. SOLUTION: In a method of manufacturing the semiconductor device, conductivity of a semiconductor nano-material among the semiconductor nano-material and metallic nano-material included in a plurality of nano-materials is lowered first. Then a cutting promoting material which promotes an action to cut the metallic nano-material is stuck on the metallic nano-material. Further, the metallic nano-material on which the cutting promoting material is cut. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011166070(A) 申请公布日期 2011.08.25
申请号 JP20100030260 申请日期 2010.02.15
申请人 NEC CORP 发明人 TOYAMA KIYOHIKO
分类号 H01L21/336;C01B31/02;H01L29/06;H01L29/786;H01L29/861;H01L51/05;H01L51/30 主分类号 H01L21/336
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