发明名称 METHOD OF MANUFACTURING POROUS STRUCTURE MATERIAL
摘要 PROBLEM TO BE SOLVED: To provide a method capable of using a rugged pattern formed according to an imprinting process as a mask for controlling a micropore production initiating position when performing micropore formation onto substrate material such as aluminum and silicon according to an electrochemical process and, thereby, efficiently and reliably forming a regular hole array structure. SOLUTION: The method of manufacturing a porous structure material in which a micropore array is controlled is characterized in that a rugged pattern is formed on the mask disposed on a substrate according to an imprinting process and the micropore formation is performed according to an electrochemical method on the substrate position corresponding to recessed parts of the formed rugged pattern. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011162870(A) 申请公布日期 2011.08.25
申请号 JP20100030111 申请日期 2010.02.15
申请人 KANAGAWA ACAD OF SCI & TECHNOL 发明人 MASUDA HIDEKI;YAGISHITA TAKASHI
分类号 C25D11/00;B29C33/38;B29C33/56;B29C59/02;C23F1/00;H01L21/027 主分类号 C25D11/00
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