发明名称 |
METHOD OF MANUFACTURING POROUS STRUCTURE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method capable of using a rugged pattern formed according to an imprinting process as a mask for controlling a micropore production initiating position when performing micropore formation onto substrate material such as aluminum and silicon according to an electrochemical process and, thereby, efficiently and reliably forming a regular hole array structure. SOLUTION: The method of manufacturing a porous structure material in which a micropore array is controlled is characterized in that a rugged pattern is formed on the mask disposed on a substrate according to an imprinting process and the micropore formation is performed according to an electrochemical method on the substrate position corresponding to recessed parts of the formed rugged pattern. COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011162870(A) |
申请公布日期 |
2011.08.25 |
申请号 |
JP20100030111 |
申请日期 |
2010.02.15 |
申请人 |
KANAGAWA ACAD OF SCI & TECHNOL |
发明人 |
MASUDA HIDEKI;YAGISHITA TAKASHI |
分类号 |
C25D11/00;B29C33/38;B29C33/56;B29C59/02;C23F1/00;H01L21/027 |
主分类号 |
C25D11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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