摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition mask, a vapor deposition device and a vapor deposition method, capable of being applied to a large-sized substrate. SOLUTION: Openings 11 are formed on the vapor deposition mask 10 so that distances between their centers may become two times the distance between pixels 51a<SB>1</SB>, 51a<SB>2</SB>of a substrate 50. The deposition mask 10 is arranged on a substrate 50, and in the state that they are positioned so that the openings 11 and shielded parts 19 are arranged alternately on each of the pixels 51a<SB>1</SB>, 51a<SB>2</SB>, 51a<SB>x</SB>, the pixel 51a<SB>1</SB>is deposited opposing the opening 11, and then the deposition mask 10 is shifted by the distance between the centers of the pixels 51a<SB>1</SB>, 51a<SB>2</SB>, and the opening 11 is positioned above undeposited pixels 51a<SB>2</SB>, 51a<SB>x</SB>opposing the shielded part 19 before the shift and in this state a thin film is deposited on the undeposited pixels 51a<SB>2</SB>, 51a<SB>x</SB>. Since the distance between the openings 11 is wider than a conventional one, a fear of damaging the deposition mask 10 at the time of forming openings 11 can be reduced to facilitate a production of a large-sized deposition mask 10. COPYRIGHT: (C)2011,JPO&INPIT
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