发明名称 |
THIN FILM TRANSISTOR PANEL AND METHOD OF MANUFACTURING THE SAME |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a thin film transistor substrate, along with a method of manufacturing the same, capable of preventing degradation of an oxide semiconductor pattern in a manufacturing process. <P>SOLUTION: The thin film transistor substrate includes: an insulating substrate 10; a gate electrode 24 and a gate insulating layer 30 formed on the insulating substrate 10; an oxide semiconductor pattern 42 arranged on the gate insulating layer 30; an etching prevention pattern 52 formed on the oxide semiconductor pattern 42; and a source electrode 65 and a drain electrode 66 formed on the etching prevention pattern 52. In the substrate, all sides of the etching prevention pattern 52 are arranged inside of side faces of the oxide semiconductor pattern 42. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011166135(A) |
申请公布日期 |
2011.08.25 |
申请号 |
JP20110016128 |
申请日期 |
2011.01.28 |
申请人 |
SAMSUNG ELECTRONICS CO LTD |
发明人 |
KIM KI-WON;RYU HYE-YOUNG;LEE WOO-GEUN;CHOI SEUNG-HA;YOUN JAE-HYOUNG;CHUNG KYOUNG-JAE;LEE YOUNG-WOOK;LEE SEIKUN;YOON KAP-SOO;KIM DO-HYUN;YANG DONG-JU;CHOI YOUNG-JOO;YOON PIL-SANG |
分类号 |
H01L29/786;G02F1/1368;G09F9/30;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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