| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polarization-influencing optical arrangement and optical system of microlithographic projection exposure apparatus, in particular an illumination system or a projection objective, and to provide a polarization-influencing optical arrangement which permits enhanced flexibility in the provision of a desired polarization distribution. <P>SOLUTION: The polarization-influencing optical arrangement includes at least one pair including a first lambda/2 plate (210, 230) and a second lambda/2 plate (220, 240). The first lambda/2 plate (210, 230) and the second lambda/2 plate (220, 240) partially overlap each other forming an overlap region (A, C) and at least one non-overlap region (B-1, B-2; D-1, D-2). <P>COPYRIGHT: (C)2011,JPO&INPIT |
