STAGE, SUBSTRATE PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS, CONTROL METHOD FOR STAGE, CONTROL METHOD FOR PLASMA PROCESSING APPARATUS, AND STORAGE MEDIA

摘要

A stage onto which is electrostatically attracted a substrate to be processed in a substrate processing apparatus, which enables the semiconductor device yield to be improved. A temperature measuring apparatus 200 measures a temperature of the substrate to be processed. A temperature control unit 400 carries out temperature adjustment on the substrate to be processed such as to become equal to a target temperature based on a preset parameter. A temperature control unit 400 controls the temperature of the substrate to be processed by controlling the temperature adjustment by the temperature control unit 400 based on a measured temperature measured by the temperature measuring apparatus 200.