发明名称 METAL ELECTRODE AND SEMICONDUCTOR ELEMENT USING THE SAME
摘要 A metal electrode is used for a pair with a semiconductor so as to sandwich a high-dielectric constant thin film between the metal electrode and the semiconductor. A metal electrode 13 comprises a metal film 11 formed of a first electrode material, and a characteristic control film 10 containing a second electrode material. The characteristic control film 10 is formed between the high-dielectric constant thin film 9 and the metal film 11. C is added to the characteristic control film 10. The addition of C reduces the crystal grain diameter of the material constituting the characteristic control film 10, and suppresses fluctuation of a Vth (threshold voltage).
申请公布号 US2011204520(A1) 申请公布日期 2011.08.25
申请号 US20080746621 申请日期 2008.12.05
申请人 NATIONAL INSTITUTE FOR MATERIALS SCIENCE 发明人 OHMORI KENJI;CHIKYO TOYOHIRO
分类号 H01L23/48 主分类号 H01L23/48
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