发明名称 LASER DEVICE FOR EXPOSURE DEVICE
摘要 <p>Disclosed is a laser device for an exposure device, which may be provided with: an MOPA type and/or an MOPO type discharge excitation gas laser unit which has a seed laser and at least one gas-discharge excitation amplification means, which receives the output light from the seed laser and which amplifies and outputs said output light; and at least one control unit selected from a laser gas control unit and a laser power source control unit, wherein, when the energy of the laser output light from the discharge excitation gas laser unit is discontinuously changed in response to a request from an exposure device, the laser gas control unit changes at least the entire pressure of the laser gas from the amplification means in accordance with the aforementioned requested energy, and the laser power source control unit changes at least the excitation strength of the discharge electrodes on the amplification means in accordance with the aforementioned requested energy.</p>
申请公布号 WO2011102486(A1) 申请公布日期 2011.08.25
申请号 WO2011JP53566 申请日期 2011.02.18
申请人 GIGAPHOTON INC.;WATANABE, HIDENORI;TANAKA, HIROSHI;WAKABAYASHI, OSAMU 发明人 WATANABE, HIDENORI;TANAKA, HIROSHI;WAKABAYASHI, OSAMU
分类号 H01S3/134;H01L21/027;H01S3/104;H01S3/225 主分类号 H01S3/134
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