| 摘要 |
PURPOSE: A cover fixture and an apparatus for processing the inductive coupling of plasma are provided to have the function of fixing a cover and the function of supplying gas using a supporting part, which supports a cover, and a base which is connected to the supporting unit. CONSTITUTION: A dielectric cover fixture(18) comprises a supporting part(18a) respectively, which supports a first part cover(12A) and a second part cover(12B), and a base(18b). The top of the base includes a convex part(18b1) projected in a cylindrical shape. A screw thread(18b2) is formed around the convex part. A gas inlet way(101) of a square shape, which is connected to a gas inlet way(21b) of a stick shape, is formed inside the convex part. The gas inlet ways are connected to the inside of a process chamber. A vent(101a) is formed passing through the low wall of the base. |
