| 摘要 |
PROBLEM TO BE SOLVED: To provide a spin coating method which applies a resist uniformly to the surface of a circle-shaped disk substrate with a hole opened in the center thereof. SOLUTION: In the spin coating method for discharging a film-forming material from a nozzle and applying it to the upper surface of the circle-shaped disk substrate with a hole opened in the center thereof while rotating the disk substrate, in an initial discharging stage where the discharge amount fluctuates, the inner diameter center of the nozzle is disposed at an initial discharge radius position, a position radially outside a position corresponding to a coating boundary of the disk substrate, to dischange the film-forming material, and in a subsequent stage where the discharge amount is stable, the inner diameter center of the nozzle is moved from the initial discharge radius position to a stabilized discharge radius position, a position in the vicinity of the coating boundary, to further discharge the film-forming material. COPYRIGHT: (C)2011,JPO&INPIT |
