发明名称 |
PROCESS FOR IN-SITU FORMATION OF CHLORIDES OF SILICON, ALUMINUM AND TITANIUM IN THE PREPARATION OF TITANIUM DIOXIDE |
摘要 |
<p>This disclosure relates to a process for producing titanium dioxide, comprising: reacting aluminum and an alloy comprising silicon and titanium having a silicon content of at least 5%, based on the weight of the alloy, with chlorine gas at temperatures above 190 °C to form chlorides of silicon, aluminum and titanium; adding titanium tetrachloride to the chlorides of silicon, aluminum and titanium; oxidizing the chlorides of silicon, aluminum and titanium and titanium tetrachloride; and forming titanium dioxide.</p> |
申请公布号 |
WO2011102863(A1) |
申请公布日期 |
2011.08.25 |
申请号 |
WO2010US55917 |
申请日期 |
2010.11.09 |
申请人 |
E. I. DU PONT DE NEMOURS AND COMPANY;MUSICK, CHARLES, DAVID |
发明人 |
MUSICK, CHARLES, DAVID |
分类号 |
C01G23/07;C01B9/02;C01B13/20;C01B33/107;C01F7/56;C09C1/36 |
主分类号 |
C01G23/07 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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