发明名称 METHOD FOR MANUFACTURING EXPOSURE APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for rapidly manufacturing an exposure apparatus. <P>SOLUTION: In a factory manufacturing an exposure apparatus 100, a body tool is joined to a stage module 20, a moving mirror of the stage module 20 is adjusted (tilt adjustment or orthogonality adjustment) by using an optical interference meter of the body tool, and the stage module 20 is shipped to a predetermined shipping destination. A body BD installed on the shipping destination has already been adjusted (attaching position adjustment or optical axis adjustment) in advance so as to be the same state as that of the body tool concerning the optical interference meter in the manufacturing factory. Accordingly, this eliminates the necessity of newly adjusting the moving mirror of the stage module 20 in the shipment destination, and the exposure apparatus 100 can be rapidly manufactured. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011165991(A) 申请公布日期 2011.08.25
申请号 JP20100028403 申请日期 2010.02.12
申请人 NIKON CORP 发明人 ICHINOSE TAKESHI
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
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