发明名称 |
Antireflective Hardmask Composition and a Method of Preparing a Patterned Material Using Same |
摘要 |
An antireflective hardmask composition layer including a polymer having Si—O and non-silicon inorganic units in its backbone. The polymer includes chromophore and transparent moieties and a crosslinking component. The antireflective hardmask composition layer is employed in a method of forming a patterned material on a substrate.
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申请公布号 |
US2011207047(A1) |
申请公布日期 |
2011.08.25 |
申请号 |
US20100711748 |
申请日期 |
2010.02.24 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BURNS SEAN D.;MEDEIROS DAVID R.;PFEIFFER DIRK |
分类号 |
G03F7/004;C08G77/00;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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