发明名称 EPI WAFER AND SILICON SINGLE CRYSTAL INGOT FOR THE SAME AND FABRICATION METHOD THEREOF
摘要 <p>An EPI wafer according to the present invention includes a single crystal substrate and an EPI layer grown on the single crystal substrate, wherein the single crystal substrate is doped with nitrogen, and crystal defects existing in the single crystal substrate have an octahedral or overlapping kite-shaped morphology.</p>
申请公布号 WO2011034284(A4) 申请公布日期 2011.08.25
申请号 WO2010KR05306 申请日期 2010.08.12
申请人 SILTRON INC.;CHOI, YOUNG-KYU;JO, HWA-JIN;GANG, HEE-BOK;KIM, KWANG-SALK 发明人 CHOI, YOUNG-KYU;JO, HWA-JIN;GANG, HEE-BOK;KIM, KWANG-SALK
分类号 H01L21/20;C30B15/00 主分类号 H01L21/20
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