VACUUM PROCESSING DEVICE

摘要

Provided is a vacuum processing device capable of stable film-forming. Said vacuum processing device can minimize electron beam divergence, even in a high vacuum, and prevent decreases in evaporation rate. The provided vacuum processing device (deposition device) (1) has a vacuum deposition chamber (50), an electron gun (20), and an electron beam focusing mechanism (150). The vacuum deposition chamber (50) is provided with an evaporation source, which contains an evaporation material (31), and a target member (10). The evaporation material (31) is heated and deposited on the target member, forming a deposited film. The electron gun, which is adjacent to the vacuum deposition chamber (50), emits an electron beam that heats the evaporation material (31). The electron beam focusing mechanism (150), which is provided inside the vacuum deposition chamber (50), focuses the electron beam emitted by the electron gun (20).