SUBSTRATE DRYING APPARATUS, SUBSTRATE DRYING METHOD AND COMPUTER-READABLE STORAGE MEDIUM STORING CONTROL PROGRAM THEREFOR

摘要

PURPOSE: A method and apparatus for drying a substrate and a computer readable storage medium with a control program are provided to reduce substrate drying time by thinning the film of rinse solutions coated on a substrate. CONSTITUTION: A rotating unit(10) rotates a target substrate. A rinse solution nozzle(20) supplies a rinse flow to the surface of the substrate. A dray gas nozzle(30) supplies dry gas to the substrate. A moving unit(40) moves the rinse nozzle and dry gas nozzle in parallel to the surface of the substrate and includes a movable arm(41), a movable shaft(42), and a driving source(43).