发明名称 COMPOUNDS HAVING PHENOL SUBSTITUENTS, PROCESS FOR PRODUCTION OF THE SAME AND RESIST COMPOSITION COMPRISING THE SAME
摘要 <p>PURPOSE: A compound having phenol substituents is provided to ensure high heat resistance and amorphous property, to secure a sublimation property and film formation property. CONSTITUTION: A compound having phenol substituents is represented by chemical formula 1. In chemical formula 1, R2 and R3 are one selected from the group consisting of hydrogen, halogen, carboxy, nitrile, aldehyde, epoxy, alkyl, cycloalkyl, heterocycloalkyl, aryl, aralkyl, heteroaryl and heteroaralkyl; R5-R7 are one selected from the group consisting of hydrogen, halogen, carboxy, hydroxy, nitrile, aldehyde, epoxy, alkyl, cycloalkyl, heterocycloalkyl, aryl, aralkyl, heteroaryl and heteroaralkyl; n1 is the integer of 1-30; and R1 and R4 are an acid-labile functional group.</p>
申请公布号 KR20110094699(A) 申请公布日期 2011.08.24
申请号 KR20100014255 申请日期 2010.02.17
申请人 KOREA KUMHO PETROCHEMICAL CO., LTD. 发明人 HAN, JOON HEE;CHO, SEUNG DUK;OH, JUNG HOON;LEE, SEUNG JAE
分类号 C07C69/616;G03F7/004 主分类号 C07C69/616
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