METHOD OF REMOVING PHOTORESIST

摘要

PURPOSE: A removal method of a photoresist is provided to reduce the processing cost by reducing the usage amount of chemical substances including stripper when removing the photoresist. CONSTITUTION: A removal method of a photoresist comprises the following steps: forming a pattern film and a photoresist pattern(24) on a substrate(20); etching the pattern film using the photoresist pattern as an etching mask; rinsing the substrate; firstly removing the photoresist pattern from the substrate by a physical method using a high pressure molecular jet and DI water; drying the substrate; and completely removing the remaining photoresist pattern from the substrate by a chemical method.