发明名称 A SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A METHOD FOR MANUFACTURING A DEVICE USING A LITHOGRAPHIC APPARATUS
摘要 PURPOSE: A substrate table, a lithographic device, and a method for manufacturing a device using the lithographic device are provided to prevent a droplet from passing through an encoder plate by using an emitter for projecting a beam to the encoder plate along a sensor beam path. CONSTITUTION: An encoder plate(100) is located on a substrate table. An air knife opening unit(310) is located in an outer gap(300) and prevents droplet from reaching the encoder plate. A fluid extraction system(330) has one or more openings on the surface of a gap to extract liquid from the gap.
申请公布号 KR20110095180(A) 申请公布日期 2011.08.24
申请号 KR20110013603 申请日期 2011.02.16
申请人 ASML NETHERLANDS B.V. 发明人 KANEKO TAKESHI;OTTENS JOOST JEROEN;LAFARRE RAYMOND WILHELMUS LOUIS
分类号 H01L21/027;G03F7/20 主分类号 H01L21/027
代理机构 代理人
主权项
地址