发明名称 |
Process-parameter prognostic system for predicting shape of semiconductor structure, semiconductor fabrication apparatus having the system, and method of using the apparatus |
摘要 |
Provided are a process-parameter prognostic system for predicting the shape of a semiconductor structure, a semiconductor fabrication apparatus having the process-parameter prognostic system, and a method of using the same. The process-parameter prognostic system may have a process prediction unit and a process-change point corresponding unit. The process prediction unit and the process-change point corresponding unit may obtain predicted parameters using measured parameters of semiconductor structures and sensor parameters of plasmas corresponding to the semiconductor structures.
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申请公布号 |
US8005562(B2) |
申请公布日期 |
2011.08.23 |
申请号 |
US20080257006 |
申请日期 |
2008.10.23 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
BAEK KYE-HYUN;KIM YOON-JAE;KIM YONG-JIN |
分类号 |
G06F19/00 |
主分类号 |
G06F19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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