发明名称 |
Tool-to-tool matching control method and its system for scanning electron microscope |
摘要 |
A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern formed on a wafer, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern formed on the wafer by using each of the plural scanning electron microscopes.
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申请公布号 |
US8003940(B2) |
申请公布日期 |
2011.08.23 |
申请号 |
US20090349751 |
申请日期 |
2009.01.07 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORPORATION |
发明人 |
OOSAKI MAYUKA;SHISHIDO CHIE;KAWADA HIROKI;MAEDA TATSUYA |
分类号 |
H01J37/28;G01N23/00;H01J37/256 |
主分类号 |
H01J37/28 |
代理机构 |
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主权项 |
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地址 |
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