发明名称 Integrated circuit including memory element doped with dielectric material
摘要 An integrated circuit includes a first electrode, a second electrode, and a damascene structured memory element coupled to the first electrode and the second electrode. The memory element has a height and a width. The height is greater than or equal to the width. The memory element includes resistance changing material doped with dielectric material.
申请公布号 US8003971(B2) 申请公布日期 2011.08.23
申请号 US20080051437 申请日期 2008.03.19
申请人 QIMONDA AG 发明人 HAPP THOMAS;PHILIPP JAN BORIS
分类号 H01L21/00 主分类号 H01L21/00
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