发明名称 Optical interference display panel and manufacturing method thereof
摘要 A first electrode and a sacrificial layer are sequentially formed on a substrate, and then first openings for forming supports inside are formed in the first electrode and the sacrificial layer. The supports are formed in the first openings, and then a second electrode is formed on the sacrificial layer and the supports, thus forming a micro electro mechanical system structure. Afterward, an adhesive is used to adhere and fix a protection structure to the substrate for forming a chamber to enclose the micro electro mechanical system structure, and at least one second opening is preserved on sidewalls of the chamber. A release etch process is subsequently employed to remove the sacrificial layer through the second opening in order to form cavities in an optical interference reflection structure. Finally, the second opening is closed to seal the optical interference reflection structure between the substrate and the protection structure.
申请公布号 US8004736(B2) 申请公布日期 2011.08.23
申请号 US20090463312 申请日期 2009.05.08
申请人 QUALCOMM MEMS TECHNOLOGIES, INC. 发明人 LIN WEN-JIAN;ARBUCKLE BRIAN;GALLY BRIAN;FLOYD PHILIP;PALMATEER LAUREN
分类号 G02B26/00;G02B26/08;B81B3/00;B81B7/00;B81B7/02;B81C1/00;F04B37/02;F04F99/00;G09F9/00;G09F9/30 主分类号 G02B26/00
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