发明名称 Method for revealing emergent dislocations in a germanium-base crystalline element
摘要 The invention relates to a method for detecting defects, more particularly emergent dislocations of an element having at least one crystalline germanium-base superficial layer. The method comprises an annealing step of the element in an atmosphere having a base that is a mixture of at least an oxidizing gas and a neutral gas enabling selective oxidizing of the emergent dislocations of the crystalline germanium-base superficial layer.
申请公布号 US8003550(B2) 申请公布日期 2011.08.23
申请号 US20090654441 申请日期 2009.12.18
申请人 COMMISSARIAT A L'ENERGIE ATOMIQUE 发明人 SANCHEZ LOIC;DEGUET CHRYSTEL
分类号 H01L21/30 主分类号 H01L21/30
代理机构 代理人
主权项
地址