发明名称 Device and manufacturing method
摘要 A description is given of a device, including a semiconductor chip, a first metal layer laterally extending over the semiconductor chip, the first metal layer having a first thickness. A dielectric layer laterally extends over the first metal layer, and a second metal layer laterally extends over the dielectric layer, the second metal layer having a second thickness that is at least four times larger than the first thickness.
申请公布号 US8003515(B2) 申请公布日期 2011.08.23
申请号 US20090562701 申请日期 2009.09.18
申请人 INFINEON TECHNOLOGIES AG 发明人 MEYER THORSTEN;BAHR ANDREAS
分类号 H01L21/4763 主分类号 H01L21/4763
代理机构 代理人
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