发明名称 |
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSTION |
摘要 |
Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin capable of increasing the solubility in an alkali developer by the action of an acid, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a resin which contains (c) a repeating unit having at least one polarity conversion group and has at least either a fluorine atom or a silicon atom. |
申请公布号 |
KR20110094054(A) |
申请公布日期 |
2011.08.19 |
申请号 |
KR20117013371 |
申请日期 |
2009.12.11 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
SAEGUSA HIROSHI;IWATO KAORU;HIRANO SHUJI;IIZUKA YUSUKE |
分类号 |
G03F7/004;G03F7/039;G03F7/075;G03F7/20 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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