The present invention provides a method of patterning an electronic or photonic material on a substrate comprising: forming a film (polymer A) of said electronic or photonic material on said substrate; and using a fluoropolymer (e.g.cytop) to protect regions of said electronic or photonic material during a patterning process.
申请公布号
WO2011004198(A3)
申请公布日期
2011.08.18
申请号
WO2010GB51130
申请日期
2010.07.09
申请人
CAMBRIDGE ENTERPRISE LIMITED;SIRRINGHAUS, HENNING;CHANG, JUI-FEN;GWINNER, MICHAEL
发明人
SIRRINGHAUS, HENNING;CHANG, JUI-FEN;GWINNER, MICHAEL