| 摘要 |
PROBLEM TO BE SOLVED: To provide a coating processing method for a substrate in which a coating liquid is effectively used and a coating liquid film is made uniform. SOLUTION: In the coating processing method for the substrate in which an antireflective film is formed by coating a surface of the substrate where a resist film is formed with a water-soluble antireflective liquid before the substrate W is exposed to a pattern, the substrate where the resist film is formed is held and rotated at a first rotational frequency, pure water DIW is supplied to a center portion of the substrate to form a liquid pool PD of the pure water, and the antireflective liquid TARC is supplied to the liquid pool of the pure water on the center position of the substrate to be mixed. Then while the antireflective liquid is continuously supplied, the substrate is rotated at a second rotational frequency to diffuse the antireflective liquid, and the antireflective liquid diffused over the entire surface of the substrate is dried at a rotational frequency higher than the first rotational frequency and lower than the second rotational frequency. COPYRIGHT: (C)2011,JPO&INPIT
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