发明名称 |
SAMPLE FOR IMAGE RESOLUTION EVALUATION, CHARGED PARTICLE BEAM DEVICE, AND SAMPLE PREPARATION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a more ideal standard sample for resolution evaluation of a charged particle beam device. SOLUTION: A sample preparation method for the charged particle device includes a step of forming fine irregularities on the surface of a substrate, a step of dripping on the substrate colloid metal or metal fine particles dispersed in an ionic liquid, and a step of removing the solution dripped on the substrate. Also, the sample preparation method for the charged particle device includes a step of forming fine irregularities on the surface of the substrate and a step of attaching metal fine particles on the surface of the substrate by sputtering. COPYRIGHT: (C)2011,JPO&INPIT
|
申请公布号 |
JP2011158257(A) |
申请公布日期 |
2011.08.18 |
申请号 |
JP20100017595 |
申请日期 |
2010.01.29 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
NYUI CHIHIRO;ARAKI MINE;DAN MURASAKI;KOI ASAMI |
分类号 |
G01N1/00;G01N1/28;G01N23/225;H01J37/20 |
主分类号 |
G01N1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|