发明名称 |
DEVELOPING APPARATUS, DEVELOPING METHOD AND STORAGE MEDIUM |
摘要 |
There is provided a developing apparatus and a developing method capable of rapidly forming a liquid film of a developing solution on an entire surface of a substrate while reducing a usage amount of the developing solution. The developing apparatus includes an airtightly sealed processing vessel that forms a processing atmosphere therein; a temperature control plate that is provided within the processing vessel and mounts the substrate thereon; an atmosphere gas supply unit that supplies an atmosphere gas including mist and vapor of a developing solution onto a surface of the substrate within the processing vessel; and a first temperature control unit that controls the temperature control plate to a temperature allowing the atmosphere gas to be condensed on the substrate. Here, an inner wall of the processing vessel is maintained at a temperature at which the atmosphere gas is hardly condensed on the inner wall.
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申请公布号 |
US2011200952(A1) |
申请公布日期 |
2011.08.18 |
申请号 |
US201113024430 |
申请日期 |
2011.02.10 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
TAKIGUCHI YASUSHI;YAMAMOTO TARO;ARIMA HIROSHI;YOSHIHARA KOUSUKE;YOSHIDA YUICHI |
分类号 |
G03B27/52;G03F7/30 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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