| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that draws a high-definition pattern at high speed. <P>SOLUTION: A light beam irradiation device 20 includes: a plurality of spatial optical modulators (DMDs 25a, 25b, 25c) having a plurality of mirrors arranged in two directions orthogonal to each other; a drive circuit (DMD drive circuit 27) driving each of the spatial optical modulators (DMDs 25a, 25b, 25c) based on drawing data, and an optical system synthesizing the light beams modulated by the respective spatial optical modulators (DMDs 25a, 25b, 25c) and emitting the beam. Light beams generated by a plurality of light sources 21a, 21b, 21c are supplied to the light beam irradiation device 20, the drawing data is supplied to the drive circuit (DMD drive circuit 27) of the light beam irradiation device 20, and the light beams supplied from the plurality of light sources 21a, 21b, 21c are modulated by the plurality of spatial optical modulators (DMDs 25a, 25b, 25c) based on the drawing data and emitted to a substrate 1 supported by a chuck 10. <P>COPYRIGHT: (C)2011,JPO&INPIT |
