发明名称 |
MASK VERIFYING METHOD, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE, AND COMPUTER PROGRAM PRODUCT |
摘要 |
According to a mask verifying method of the embodiment, a difference between an actual dimension of a mask pattern and a simulation dimension is calculated as a computational estimated value. Moreover, a difference between an actual dimension of the mask pattern that is actually measured and a dimension on pattern data is calculated as an actually-measured difference. Then, it is verified whether a mask pattern dimension passes or fails based on the calculated value. When calculating the computational estimated value, a model function, which is set based on each correspondence relationship between an actual dimension and a mask simulation dimension of a test pattern, which includes a plurality of types of pattern ambient environments, to the mask pattern.
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申请公布号 |
US2011201138(A1) |
申请公布日期 |
2011.08.18 |
申请号 |
US201113024604 |
申请日期 |
2011.02.10 |
申请人 |
NOJIMA SHIGEKI;MATSUNAWA TETSUAKI;HASEBE SHIGERU;MIYAIRI MASAHIRO |
发明人 |
NOJIMA SHIGEKI;MATSUNAWA TETSUAKI;HASEBE SHIGERU;MIYAIRI MASAHIRO |
分类号 |
H01L21/66;G03F1/36;G03F1/68;G03F1/70;G03F1/84;G06F17/50;H01L21/027 |
主分类号 |
H01L21/66 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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