发明名称 APPARATUS FOR MANUFACTURING TRICHLOROSILANE
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing trichlorosilane, which heats a supplied gas at a high thermal efficiency, which can be upsized without damaging the thermal efficiency, and which can carry out mass production. SOLUTION: The apparatus for manufacturing trichlorosilane includes a reaction vessel 20 having a reaction chamber 11 in which a raw material gas containing tetrachlorosilane and hydrogen is supplied to produce a reaction gas containing trichlorosilane and hydrogen chloride, a heater 30 equipped in the reaction chamber 11 and heating the raw material gas, a heat insulating vessel 40 installed so as to surround the periphery of the reaction vessel 20, and a gas supply flow passage 15 installed between the heat insulating vessel 40 and the reaction vessel 20 so as to surround the reaction vessel 20 and supplying the raw material gas to the reaction chamber 11. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011157223(A) 申请公布日期 2011.08.18
申请号 JP20100018950 申请日期 2010.01.29
申请人 MITSUBISHI MATERIALS CORP 发明人 IKUKAWA MITSUTOSHI
分类号 C01B33/107 主分类号 C01B33/107
代理机构 代理人
主权项
地址